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Equipments

Sample preparations
Drying furnace


Weighting: microbalance


Mixing: auto agate mortar


Isostatic pressing


Firing: home-made furnace (290<T<1800 K)


High temperature furnace (Max. 1700℃ and gas-flow are avaible)


MILA-5000 UHV furnace for sample annealing (RTA)
(Max T=1200oC, Heating Rate>50oC/s, UHV:10-4Pa, Ar, N2, O2 )


Spark Plasmas Sintering sytem SPS-210SH
(T<2400℃, Force:0.2-21.3kN , 2012/02/15)


Crystal growth: Bridgman technique (Max. 1800℃, Two zones )


Cutter with goniometer


Polishing machine


Electrode coating (Quick coater)


Poling system
(Votage: 0-20kV, Temperature: 290-530K)


Structural analysis
Powder X-ray


Electrical measurements
Low-Temperature measurement system
(T:4K-450 K, Dielectric, D-E loop, resistance, optical measruements are available, 2011/06/01)


Home-made high-temperature dielectric measurement system-1
(290-1300K, available for thin film measruements, 2013/05/03)


Home-made high-Temperature dielctric measurement system-2
(T:290-1300K, 2010/7/22)


FCE-3 ferroelectric measurement system
( D-E loop, Strain-E loop, strain range: 1nm-50000nm, voltage range:0-10000 V, temperature range: 173-473 K, 2011/01/31)


Home-made D-E hysteresis loop measurement system


Precision LCR meter E4980 20Hz-2MHz


Keithley 6517B Electrometer/High Resistance Meter
( Measures resistances up to 1016Ω/1fA - 20mA current measurement range)

Piezo d33/d31 meter (ZJ-6B)


Optical observations
T-variable Polarized-light microscope
(Linkam 19100L, T:83K-873K, Lens:x2,x5,x10,x20,x50,x100. For topography observation, ferroelectric domain observation under electric field. With two probe, dielectric measurements for thin film is also avaible.

Interferometer for linear E-O efficient measurements



Last Updated: 2015/04/15 © Fu's Lab